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  * Last column : F = Presentation in French
                           E = Presentation in English
                           T = Simultaneous  traduction available

new generation materials and sAFETY – Friday, aPRIL 24

07h30

Welcome : Registration and coffee
(Foyer International & Cartier - Level 3)

 

08h00

Welcome Address

 
 

Session 1: New Generation Materials
(Cartier room - Level 3)

 
08h30

Polymer Composites with nanoparticles
Suong Van Hoa, Concordia, Canada
Abstract available

T
09h00

Plasma Synthesis of metallic and ceramic nanomaterials: tools for technologic development
Maher Boulos, Tekna Plasma Systems, Canada
Abstract available

T
09h30

Nanocristalline Cellulose (NCC) : Green Nanomaterial
Jean Bouchard, FPInnovations - Division Paprican, Canada
Abstract available

T

10h00

Exhibition and Poster Session/ Health Break
(Foyer International & Cartier - Level 3)
 

 

Session 2: Nanomaterials and Safety
(Cartier room - Level 3)

 
10h30

Challenges facing the workplaces to ensure the protection of workers from occupational injury and disease resulting from the use and manufacture of nanomaterials
Dr Charles Geraci, National Institute for Occupational Safety and Health, USA
Presentation available

T
11h15

The IRSST Best Practices Guide to Work Safely with Nanoparticles in Research Laboratories and Occupational Settings
Claude Ostiguy, IRSST, Canada
Abstract available

T
11h55

Poster session award

 

12h00

Networking Buffet (Foyer International & Cartier - Level 3)

 
13h00

Protective Clothing Against Nanoparticles
Dr Toan Vu-Khanh, ÉTS , Canada
Abstract available

T
13h30

The GoodNanoGuide: an interactive forum for developing good workplace practices for handling nanomaterials
Mr Matthew Jaffe, Crowell & Moring
Presentation available

T
 

Session 3: Nanomaterials and MEMS
(Cartier room - Level 3)

 
14h00

NANO 2009 Award

T
14h05

Characteristics of Metal-CNT Composites Prepared by Plating Technology
Prof. Susumu Arai, Shinshu University, Nagano, Japan
Abstract available

T
14h30

Forum: The Future of Microelectronics in Québec
Dave Danovitch, IBM
Dan Gale, CMC Microsystems
Andrew Kirk, McGill University
Luc Ouellet, DALSA Semiconductor

T

16h00

Closure

 

 

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